The mechanism of growth of ZnO nanorods by reactive sputtering
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DOI: 10.1016/j.apsusc.2016.12.097
Abstract: Abstract DC reactive magnetron sputtering of zinc target in argon-oxygen sputtering atmosphere has been used to grow ZnO thin films/nanorods on Si in a wide substrate temperature range of 300–750 °C and under different sputtering conditions,… read more here.
Keywords: sputtering atmosphere; substrate temperature; growth zno; mechanism growth ... See more keywords
Effect of sputtering atmosphere on the characteristics of ZrOx resistive switching memory
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DOI: 10.1088/1361-6641/aa637a
Abstract: A ZrOx switching layer with different oxygen content for TiN/ZrOx/Pt resistive switching (RS) memory was prepared by magnetron sputtering in different atmospheres such as N2/Ar mixture, O2/Ar mixture as well as pure Ar. The morphology,… read more here.
Keywords: sputtering atmosphere; memory; zrox resistive; zrox ... See more keywords