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Published in 2022 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2021.151265
Abstract: Abstract An atomistic study of the W and Be mixing during magnetron sputtering deposition using the SRIM software based on the binary collision simulation by Monte Carlo method is presented. The calculations performed clearly show…
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Keywords:
magnetron sputtering;
nanoscale multilayers;
sputtering deposition;
multilayers intermixing ... See more keywords
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Published in 2019 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2019.01.011
Abstract: Abstract High-quality AlN templates fabricated by sputtering-deposition and post-deposition high-temperature annealing have great potential for deep ultraviolet light-emitting device applications. In this work, we fabricated AlN films on 6H-SiC substrates by sputtering and face-to-face annealing…
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Keywords:
aln;
sic substrates;
sputtering deposition;
aln templates ... See more keywords
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1
Published in 2019 at "Results in Physics"
DOI: 10.1016/j.rinp.2019.102286
Abstract: Abstract The substrate/(200–900 nm) Al:ZnO (AZO)/15 nm Zn films were deposited on glass substrates at room temperature by magnetron sputtering, followed by a face-to-face annealing in vacuum. The effect of AZO thickness and the annealing treatment on…
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Keywords:
multilayer films;
diffusion;
sputtering deposition;
azo ... See more keywords
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Published in 2019 at "Scientific Reports"
DOI: 10.1038/s41598-019-56306-0
Abstract: We have characterized highly conductive Si-doped GaN films with a high electron mobility of 112 cm2V−1s−1 at an electron concentration of 2.9 × 1020 cm−3, prepared using pulsed sputtering deposition (PSD). With an increase in the doping concentration,…
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Keywords:
sputtering deposition;
pulsed sputtering;
highly conductive;
doped gan ... See more keywords
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Published in 2020 at "Journal of Materials Chemistry C"
DOI: 10.1039/d0tc01105c
Abstract: To control the polarization switching characteristics of ferroelectric HfxZr1−xO2 (HZO) thin films, the effects of oxygen partial pressure (PO2) during the sputtering deposition of HZO and the area ratio (SI/SF) of metal–ferroelectric–metal–insulator–semiconductor (MFMIS) gate stacks…
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Keywords:
sputtering deposition;
thin films;
operations ferroelectric;
oxygen partial ... See more keywords
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1
Published in 2019 at "Materials Research Express"
DOI: 10.1088/2053-1591/ab00cd
Abstract: MSb (M=Fe, Ni, Co) thin films were successfully prepared by magnetron sputtering deposition. The as-prepared MSb (M=Fe, Ni, Co) thin films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive spectrometer…
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Keywords:
thin films;
ion;
sputtering deposition;
msb thin ... See more keywords