Articles with "sputtering deposition" as a keyword



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Nanoscale W/Be multilayers: Intermixing during magnetron sputtering deposition and effect of heat treatment

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Published in 2022 at "Applied Surface Science"

DOI: 10.1016/j.apsusc.2021.151265

Abstract: Abstract An atomistic study of the W and Be mixing during magnetron sputtering deposition using the SRIM software based on the binary collision simulation by Monte Carlo method is presented. The calculations performed clearly show… read more here.

Keywords: magnetron sputtering; nanoscale multilayers; sputtering deposition; multilayers intermixing ... See more keywords
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Fabrication of AlN templates on SiC substrates by sputtering-deposition and high-temperature annealing

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Published in 2019 at "Journal of Crystal Growth"

DOI: 10.1016/j.jcrysgro.2019.01.011

Abstract: Abstract High-quality AlN templates fabricated by sputtering-deposition and post-deposition high-temperature annealing have great potential for deep ultraviolet light-emitting device applications. In this work, we fabricated AlN films on 6H-SiC substrates by sputtering and face-to-face annealing… read more here.

Keywords: aln; sic substrates; sputtering deposition; aln templates ... See more keywords
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Magnetron sputtering deposition of Zn/AZO multilayer films: Towards the understanding of Zn diffusion in AZO film

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Published in 2019 at "Results in Physics"

DOI: 10.1016/j.rinp.2019.102286

Abstract: Abstract The substrate/(200–900 nm) Al:ZnO (AZO)/15 nm Zn films were deposited on glass substrates at room temperature by magnetron sputtering, followed by a face-to-face annealing in vacuum. The effect of AZO thickness and the annealing treatment on… read more here.

Keywords: multilayer films; diffusion; sputtering deposition; azo ... See more keywords
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Optical characteristics of highly conductive n-type GaN prepared by pulsed sputtering deposition

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Published in 2019 at "Scientific Reports"

DOI: 10.1038/s41598-019-56306-0

Abstract: We have characterized highly conductive Si-doped GaN films with a high electron mobility of 112 cm2V−1s−1 at an electron concentration of 2.9 × 1020 cm−3, prepared using pulsed sputtering deposition (PSD). With an increase in the doping concentration,… read more here.

Keywords: sputtering deposition; pulsed sputtering; highly conductive; doped gan ... See more keywords
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Improvements in the synaptic operations of ferroelectric field-effect transistors using Hf0.5Zr0.5O2 thin films controlled by oxygen partial pressures during the sputtering deposition process

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Published in 2020 at "Journal of Materials Chemistry C"

DOI: 10.1039/d0tc01105c

Abstract: To control the polarization switching characteristics of ferroelectric HfxZr1−xO2 (HZO) thin films, the effects of oxygen partial pressure (PO2) during the sputtering deposition of HZO and the area ratio (SI/SF) of metal–ferroelectric–metal–insulator–semiconductor (MFMIS) gate stacks… read more here.

Keywords: sputtering deposition; thin films; operations ferroelectric; oxygen partial ... See more keywords
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Magnetron sputtering deposition of MSb(M=Fe, Ni, Co) thin films as negative electrodes for Li-ion and Na-ion batteries

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Published in 2019 at "Materials Research Express"

DOI: 10.1088/2053-1591/ab00cd

Abstract: MSb (M=Fe, Ni, Co) thin films were successfully prepared by magnetron sputtering deposition. The as-prepared MSb (M=Fe, Ni, Co) thin films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive spectrometer… read more here.

Keywords: thin films; ion; sputtering deposition; msb thin ... See more keywords