Studies of Cu‐doped ZnS thin films prepared by sputtering technique
Sign Up to like & getrecommendations! Published in 2017 at "Surface and Interface Analysis"
DOI: 10.1002/sia.6130
Abstract: Radio frequency magnetron sputtering technique has been used to deposit Cu-doped ZnS thin films on glass and n-type Si(100) substrates at room temperature. Crystalline structure, surface morphology, and elemental oxidation states have been studied by… read more here.
Keywords: thin films; microscopy; doped zns; spectroscopy ... See more keywords
Hard Cr2O3 coatings on SS316L substrates prepared by reactive magnetron sputtering technique: a potential candidate for orthopedic implants
Sign Up to like & getrecommendations! Published in 2019 at "Environmental Science and Pollution Research"
DOI: 10.1007/s11356-019-05006-3
Abstract: Abstract316L stainless steel (SS) implants suffer from tribological and biocompatibility problems which limit their service lifetime. In order to improve the surface properties of 316L SS for orthopedic implant applications, hard chromium oxide coatings were… read more here.
Keywords: magnetron sputtering; reactive magnetron; spectroscopy; cr2o3 coatings ... See more keywords
Effects of Cr doping on the mechanical properties of AlN films grown by the co-sputtering technique
Sign Up to like & getrecommendations! Published in 2019 at "Ceramics International"
DOI: 10.1016/j.ceramint.2018.10.058
Abstract: Abstract We report the mechanical properties of Cr-doped AlN thin films synthesized by reactive magnetron co-sputtering technique with different Cr concentrations (0, 2, 4, 6 and 11 at%). Surface chemical analysis and crystal structure studies of… read more here.
Keywords: mechanical properties; effects doping; sputtering technique; doping mechanical ... See more keywords
Application of magnetron sputtering technique to fabricate sulfur/carbon composites cathode plates of lithium-sulfur battery
Sign Up to like & getrecommendations! Published in 2020 at "Materials Letters"
DOI: 10.1016/j.matlet.2020.127888
Abstract: Abstract The magnetron sputtering technique is introduced to fabricate sulfur/carbon composite cathode plates for lithium-sulfur (Li-S) batteries by reducing the size of sulfur particles so they combine well with carbon particles without adding a binder… read more here.
Keywords: cathode plates; magnetron sputtering; carbon; sulfur carbon ... See more keywords
Temperature dependent current- and capacitance-voltage characteristics of W/n-Si structures with two-dimensional WS2 and three-dimensional WO3 interfaces deposited by RF sputtering technique
Sign Up to like & getrecommendations! Published in 2020 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2020.105204
Abstract: Abstract In this study, tungsten disulfide (WS2) and tungsten trioxide (WO3) thin films are deposited on n-Si by RF sputtering technique. The optical, morphological and structural characteristics of these films are investigated. The XRD patterns… read more here.
Keywords: voltage; deposited sputtering; ws2 wo3; two dimensional ... See more keywords
Optical limiting in multilayer graphene films on a cobalt buffer-layer produced by the sputtering technique.
Sign Up to like & getrecommendations! Published in 2023 at "Applied optics"
DOI: 10.1364/ao.477209
Abstract: Multilayer graphene (MLG) thin films were produced by a sputtering technique on a cobalt buffer-layer prepared at 500°C and thermal annealed after the deposition. The transformation of amorphous carbon (C) to graphene occurs by diffusion… read more here.
Keywords: sputtering technique; graphene; produced sputtering; cobalt buffer ... See more keywords