Double stack layer structure of SiNx/pm-Si thin films for downshifting and antireflection properties
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DOI: 10.1016/j.matlet.2017.05.121
Abstract: Abstract In this work, we propose a double stack layer design of SiNx/pm-Si thin films by using dichlorosilane in plasma enhanced chemical vapor deposition (PECVD). Adequate deposition condition has been found to attain the average… read more here.
Keywords: layer; double stack; stack layer; sinx thin ... See more keywords