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Published in 2020 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2020.3027423
Abstract: Multi-metal interconnection is a crucial technology for the development of large-scale integrated circuits (ICs). However, organic semiconductors are not robust enough to be compatible with conventional lithography-and-etching-based via-forming methods. Thus, an alternative metal interconnect method…
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Keywords:
metal;
logic circuits;
multi stage;
organic logic ... See more keywords