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Published in 2024 at "Advanced Materials"
DOI: 10.1002/adma.202312747
Abstract: Herein, a high‐quality gate stack (native HfO2 formed on 2D HfSe2) fabricated via plasma oxidation is reported, realizing an atomically sharp interface with a suppressed interface trap density (Dit ≈ 5 × 1010 cm−2 eV−1).…
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Keywords:
steep switching;
hfse2 gate;
stack;
gate stack ... See more keywords
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Published in 2023 at "Nanoscale"
DOI: 10.1039/d2nr06547a
Abstract: A steep switching device with a low subthreshold swing (SS) that overcomes the fundamental Boltzmann limit (kT/q) is required to efficiently process a continuously increasing amount of data. Recently, two-dimensional material-based impact ionization transistors with…
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Keywords:
ionization;
ionization based;
impact ionization;
based threshold ... See more keywords
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Published in 2024 at "Nanomaterials"
DOI: 10.3390/nano14201667
Abstract: Feedback field-effect transistors (FBFETs) have been studied to obtain near-zero subthreshold swings at 300 K with a high on/off current ratio ~1010. However, their structural complexity, such as an epitaxy process after an etch process…
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Keywords:
steep switching;
field effect;
demonstration steep;
feedback field ... See more keywords