Analysis by HR-STEM of the Strain Generation in InP after SiNx Deposition and ICP Etching
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DOI: 10.1007/s11664-020-08312-6
Abstract: Microelectronic processing to fabricate electronic devices on Si has been extensively studied and well characterized for several decades. This type of processing has been extrapolated for the fabrication of devices on other semiconducting materials such… read more here.
Keywords: inp; deposition; analysis stem; strain generation ... See more keywords