Investigation of the Electrochemical Stop Etching of Silicon Upon the Fabrication of Cantilevers
Sign Up to like & getrecommendations! Published in 2020 at "Semiconductors"
DOI: 10.1134/s1063782620130102
Abstract: Anisotropic etching in potassium hydroxide (KOH) solution with electrochemical stop is commonly used in the formation of thin silicon membranes of sensitive elements in various microelectromechanical devices. However, there are almost no data on investigating… read more here.
Keywords: stop etching; type layer; electrochemical stop; surface ... See more keywords