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Published in 2017 at "Solid-state Electronics"
DOI: 10.1016/j.sse.2017.04.009
Abstract: Abstract The carrier microscopic transport process of uniaxial strained Si n-channel metal-oxide semiconductor field-effect transistor (NMOSFET) has been analyzed under γ-ray radiation. The variation of electrical characteristics of the uniaxial strained Si nanometer NMOSFET has…
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Keywords:
dose radiation;
effect;
uniaxial strained;
total dose ... See more keywords