Rational Strategy for Space-Confined Atomic Layer Deposition.
Sign Up to like & getrecommendations! Published in 2023 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.3c01443
Abstract: Atomic layer deposition (ALD) offers excellent controllability of spatial uniformity, film thickness at the Angstrom level, and film composition even for high-aspect-ratio nanostructured surfaces, which are rarely attainable by other conventional deposition methodologies. Although ALD… read more here.
Keywords: strategy space; layer deposition; atomic layer; deposition ... See more keywords