Remarkable Bias‐Stress Stability of Ultrathin Atomic‐Layer‐Deposited Indium Oxide Thin‐Film Transistors Enabled by Plasma Fluorination
Sign Up to like & getrecommendations! Published in 2024 at "Advanced Functional Materials"
DOI: 10.1002/adfm.202401170
Abstract: A low‐thermal‐budget fabrication approach is developed to realize high‐performance fluorine‐doped indium oxide (In2O3:F) thin‐film transistors (TFTs) with remarkable bias‐stress stability. The ultrathin transistor channel layer is prepared by a re‐developed atomic layer deposition (ALD) process… read more here.
Keywords: layer; bias stress; stress stability; remarkable bias ... See more keywords
Thermal annealing effects on the stress stability in silicon dioxide films grown by plasma-enhanced chemical vapor deposition
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DOI: 10.1007/s00542-016-3005-1
Abstract: The stress stability in plasma-enhanced chemical vapor deposition (PECVD) silicon dioxide (SiO2) films is a key factor of device performance. In this study, the PECVD SiO2 films are annealed at 400–1000 °C in a nitrogen (N2)… read more here.
Keywords: stress stability; chemical vapor; enhanced chemical; stability ... See more keywords
Physicochemical characterization of dapagliflozin and its solid-state behavior in stress stability test
Sign Up to like & getrecommendations! Published in 2021 at "Drug Development and Industrial Pharmacy"
DOI: 10.1080/03639045.2021.1908333
Abstract: Abstract As an active pharmaceutical ingredient, dapagliflozin propanediol monohydrate (D-PD) has been used in the solvated form consisting of dapagliflozin compounded with (S)-propylene glycol and monohydrate at a 1:1:1 ratio. However, dapagliflozin propanediol loses the… read more here.
Keywords: solid state; stress stability; state behavior; dapagliflozin ... See more keywords