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Published in 2017 at "Applied Surface Science"
DOI: 10.1016/j.apsusc.2017.02.147
Abstract: Abstract Nanoindentation measurements along with atomic force microscopy, X-ray diffraction, and residual stress analyses on the basis of Raman measurements have been performed to characterize stress-tailored AlN thin films grown using reactive RF magnetron sputtering.…
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Keywords:
stress tailored;
thin films;
aln thin;
stress ... See more keywords