High-quality efficient anti-reflection nanopillar structures layer prepared by a new type vibration-assisted UV nanoimprint lithography
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DOI: 10.1016/j.jmapro.2020.11.028
Abstract: Abstract In order to effectively improve the filling rate of photoresist, a non-resonant vibration-assisted UV nanoimprint lithography (NRVA-NIL) is proposed to prepare the AR layer. The vibration by piezoelectric driven is applied below the photoresist… read more here.
Keywords: vibration; assisted nanoimprint; vibration assisted; nanoimprint lithography ... See more keywords