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Published in 2018 at "Journal of Physical Chemistry C"
DOI: 10.1021/acs.jpcc.8b03771
Abstract: Inorganic resists are promising for nanomanufacturing because of their potential for high-resolution and low line-edge roughness patterning and exceptional sensitivity to extreme ultraviolet (EUV) radiation. Hafnium oxide peroxide hydroxide sulfate (HafSOx) is a model EUV…
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Keywords:
inorganic resists;
study hafsox;
mechanistic study;
desorption ... See more keywords