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Published in 2020 at "Silicon"
DOI: 10.1007/s12633-020-00403-7
Abstract: The study presents the typical aspects of silicon thin films in terms of growth under variation of applied power using Radio frequency Plasma Enhanced Chemical Vapor Deposition technique (RF-PECVD). The corresponding material found to maintain…
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Keywords:
silicon thin;
nanocrystalline silicon;
thin films;
sub nanocrystalline ... See more keywords