Investigation of microstructure and electrical properties of Sm doped ceria thin films
Sign Up to like & getrecommendations! Published in 2017 at "Solid State Ionics"
DOI: 10.1016/j.ssi.2016.11.007
Abstract: Abstract Sm0.2Ce0.8O2 − δ (SDC) thin films (~ 1.9 μm) were deposited on SiO2, Alloy 600 (Fe-Ni-Cr), and Al2O3 substrates, using e-beam evaporation technique. The deposition rate was 0.2 nm/s ÷ 1.6 nm/s, and substrate temperature during the formation of thin films was… read more here.
Keywords: 723 873; thin films; substrate temperatures; substrate temperature ... See more keywords
Femtosecond Laser Deposition of Germanium Selenide onto Silicon Platform at Different Substrate Temperatures
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DOI: 10.3390/nano12122003
Abstract: Germanium selenide (GeSe) thin films were fabricated by employing femtosecond pulsed-laser deposition (fs-PLD) on silicon (100) substrates at various substrate temperatures, ranging from 25 °C to 600 °C. The thin films’ surface morphology qualities and… read more here.
Keywords: laser deposition; substrate temperatures; germanium selenide; thin films ... See more keywords
Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnOx Films at Different Substrate Temperatures
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DOI: 10.3390/nano12162859
Abstract: The promising functional tin oxide (SnOx) has attracted tremendous attention due to its transparent and conductive properties. The stoichiometric composition of SnOx can be described as common n-type SnO2 and p-type Sn3O4. In this study,… read more here.
Keywords: enhanced atomic; atomic layer; plasma enhanced; substrate temperatures ... See more keywords