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Published in 2018 at "Journal of Computational Electronics"
DOI: 10.1007/s10825-018-1141-9
Abstract: A continuous and accurate model based on the two-dimensional (2D) potential solution of a tunnel field-effect transistor (TFET) with undoped vertical surrounding-gate (VSG) structure is proposed. Both ambipolarity and dual modulation effects are included to…
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Keywords:
surrounding gate;
continuous semianalytical;
vertical surrounding;
tunnel ... See more keywords
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Published in 2019 at "AEU - International Journal of Electronics and Communications"
DOI: 10.1016/j.aeue.2019.152924
Abstract: Abstract The leakages in off state, particularly Gate Induced Drain Leakage (GIDL) has been addressed and reduced by proposing a Shallow Extension Engineered Dual Material Surrounding Gate (SEE-DM-SG) MOSFET. The shallow extensions create an insulating…
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Keywords:
surrounding gate;
mosfet;
noise;
see mosfet ... See more keywords
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Published in 2019 at "Superlattices and Microstructures"
DOI: 10.1016/j.spmi.2019.05.016
Abstract: Abstract An accurate two dimensional subthreshold modeling of Germanium based Dual Halo Gate stacked Triple Material Surrounding Gate (Ge-DH-GS-TM-SG) tunnel field effect transistor is proposed for the first time in this paper. The model is…
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Keywords:
triple material;
material surrounding;
halo;
surrounding gate ... See more keywords
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Published in 2018 at "AIP Advances"
DOI: 10.1063/1.5043450
Abstract: An analytical model for detection of terahertz radiation by plasma wave in cylindrical surrounding-gate (SRG) MOSFETs is presented. In comparison with traditional drain-current models, the rectification response of terahertz signal due to current self-mixing in…
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Keywords:
analytical model;
detection;
surrounding gate;
model ... See more keywords
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Published in 2024 at "IEEE Access"
DOI: 10.1109/access.2024.3382932
Abstract: In this article, a honeycomb vertical surrounding gate access transistor array scheme is proposed to further decrease the DRAM cell area with aggressively shrink bit line (BL) pitch and word line (WL) pitch adopting the…
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Keywords:
transistor;
surrounding gate;
tex math;
inline formula ... See more keywords
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Published in 2020 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2020.3021996
Abstract: We have demonstrated, for the first time, a surrounding gate vertical-channel field-effect transistor (FET) with a gate length of 40 nm by introducing back-end-of-line (BEOL) process-compatible oxide semiconductor (OS) In-Al-Zn-O as a channel material. Fabricated…
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Keywords:
fet;
vertical channel;
gate vertical;
surrounding gate ... See more keywords