The influence of the conditions of synthesis on the composition and mechanical properties of silicon oxycarbonitride nanocomposite films
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DOI: 10.1134/s2070205117020095
Abstract: Dielectric films of hydrogenated silicon oxycarbonitride SiCxNyOz:H were prepared by plasmaenhanced chemical vapor deposition using gas mixtures of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) or 1,1,3,3-tetramethyldisilazane (TMDS) with oxygen and nitrogen in the temperature range of 373–973 K. The… read more here.
Keywords: synthesis composition; silicon oxycarbonitride; conditions synthesis; influence conditions ... See more keywords