Telecentricity measurement for exposure system of photolithography tools
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DOI: 10.1117/1.oe.59.3.034109
Abstract: Abstract. As the critical dimensions of integrated circuits continue to grow smaller, overlay error is becoming increasingly important. Overlay error is mainly determined by the telecentricity of the exposure system in a photolithography tool. Existing… read more here.
Keywords: exposure system; system photolithography; telecentricity; measurement ... See more keywords