Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
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DOI: 10.1088/1361-6595/ae2158
Abstract: Precise control of ion energy distribution functions (IEDFs) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In this work, a low frequency (100 kHz) tailored pulse-wave-shaped… read more here.
Keywords: inductively coupled; tailored waveform; precise control; ion ... See more keywords