Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries
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DOI: 10.1016/j.mssp.2019.104883
Abstract: Abstract The chemical mechanical polishing (CMP) of Cu/Co/TaN barrier liner stack of the sub-14nm devices was associated with several challenges, one of which was to screen out the desired slurries formulation. In this paper, the… read more here.
Keywords: tan barrier; barrier; mechanical polishing; potassium tartrate ... See more keywords