Tape‐Assisted Residual Layer‐Free One‐Step Nanoimprinting of High‐Index Hybrid Polymer for Optical Loss‐Suppressed Metasurfaces (Adv. Sci. 10/2025)
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DOI: 10.1002/advs.202570061
Abstract: Tape‐Assisted Nanoimprint Lithography In article number 2409371, Junsuk Rho, Yujin Park, and co‐workers introduce a novel fabrication technique that utilizes tape to exfoliate the high‐index residual layer in particle‐embedded resinbased nanoimprint lithography. This method enables… read more here.
Keywords: tape assisted; residual layer; high index; tape ... See more keywords