Uncertainty Estimation and Design Optimization of 2D Diffraction-Based Overlay Metrology Targets
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DOI: 10.1021/acsphotonics.0c00911
Abstract: Scatterometry is an optical metrology technique, in which light scattered from a specifically designed grating stack (overlay target) is measured in the far-field. Using 1D periodic overlay target designs the technique has been shown to… read more here.
Keywords: overlay target; uncertainty; target designs; metrology ... See more keywords