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Published in 2022 at "Journal of the Electrochemical Society"
DOI: 10.1149/1945-7111/ac5ad8
Abstract: The microstructure and crystallographic texture of copper electrodeposits in millimeter scale through silicon vias are characterized using electron backscatter diffraction. The deposits obtained from additive-containing CuSO4-H2SO4 electrolytes are characteristic of the superconformal deposition process, with…
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Keywords:
texture copper;
silicon vias;
growth;
millimeter scale ... See more keywords