Effect of modulation structure on the microstructural and mechanical properties of TiAlSiN/CrN thin films prepared by high power impulse magnetron sputtering
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DOI: 10.1016/j.surfcoat.2018.11.069
Abstract: Abstract The newly developed TiAlSiN/CrN multilayer films were deposited on silicon Si (100) substrates and tungsten carbide steel substrates by high power impulse magnetron sputtering technique (HiPIMS) at 80 °C working temperature. The effect of modulation… read more here.
Keywords: high power; impulse magnetron; tialsin crn; magnetron sputtering ... See more keywords