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Published in 2018 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2017.11.007
Abstract: Abstract Multilevel states are clearly distinguished in TiN/Ti/HfO2/W RRAM devices by programming sequential voltage ramps and trains of pulses. It has been shown that the filamentary conductance has a continuous dependence on the current compliance…
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Keywords:
multilevel capability;
investigation multilevel;
tin hfo2;
multilevel ... See more keywords