Influence of Si-addition on wear and oxidation resistance of TiWSixN thin films
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DOI: 10.1016/j.ceramint.2019.05.295
Abstract: Abstract TiWSixN films were deposited using a magnetron co-sputtering system on silicon (111), 316L stainless steel, and M2 high-speed steel substrates. The silicon target current density was varied from 0 mA/cm2 to 4.32 mA/cm2 in order to… read more here.
Keywords: thin films; microscopy; oxidation; resistance ... See more keywords