Comparison of diffraction patterns exposed by pulsed and CW lasers on positive-tone photoresist.
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DOI: 10.1364/ao.56.002241
Abstract: Two different grating formation geometries for recording onto the positive-tone photoresist with pulsed laser and continuous-wave sources are analyzed and compared. Diffraction efficiency measurements and atomic force microscopy (AFM) examination have been performed in order… read more here.
Keywords: diffraction; pulsed laser; tone photoresist; positive tone ... See more keywords