Formation of triazole inhibitive film on copper surface by click assembly in presence of Cu2S quantum dots
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DOI: 10.1002/sia.6979
Abstract: The triazole inhibitive film was assembled on copper surface via the click reaction between p‐toluenesulfonyl azide (TA) and propiolic acid (PA) in presence of Cu2S quantum dots (CuDs). The click‐assembled film on copper surface has… read more here.
Keywords: inhibitive film; copper surface; triazole inhibitive; surface ... See more keywords