Bismuth trichloride as a molecular precursor for silicon doping
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DOI: 10.1063/5.0145772
Abstract: Dopant impurity species can be incorporated into the silicon (001) surface via the adsorption and dissociation of simple precursor molecules. Examples include phosphine (PH3), arsine (AsH3), and diborane (B2H6) for the incorporation of phosphorus, arsenic,… read more here.
Keywords: bismuth trichloride; chemistry; trichloride molecular; precursor ... See more keywords