A pressure tuned stop-flow atomic layer deposition process for MoS 2 on high porous nanostructure and fabrication of TiO 2 /MoS 2 core/shell inverse opal structure
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DOI: 10.1016/j.apsusc.2017.06.016
Abstract: Abstract MoS 2 thin films are obtained by atomic layer deposition (ALD) in the temperature range of 120–150 °C using Mo(CO) 6 and dimethyl disulfide (DMDS) as precursors. A pressure tuned stop-flow ALD process facilitates the… read more here.
Keywords: stop flow; pressure tuned; tuned stop; structure ... See more keywords