Blistering of tungsten films deposited by magnetron sputtering after helium irradiation
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DOI: 10.1016/j.fusengdes.2018.02.091
Abstract: Abstract In this paper, tungsten films were deposited on tungsten substrates by magnetron sputtering and some films were annealed at 1273 K for 1 h. Subsequently, the morphology and microstructure of as-deposited and pre-annealed films were measured… read more here.
Keywords: tungsten films; helium irradiation; films deposited; microscopy ... See more keywords