Impacts of O2 Plasma on Negative Gate Bias Stress Instability of Tunnel Thin-Film Transistor
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DOI: 10.1109/tps.2020.3015729
Abstract: In this work, the impacts of oxygen (O2) plasma treatment on the performance and negative bias temperature instability (NBTI) of tunnel thin-film transistors (T-TFTs) with polycrystalline-silicon channel material are studied. After O2 plasma treatment, the… read more here.
Keywords: tunnel thin; sub plasma; sub sub; sub ... See more keywords