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Published in 2018 at "Journal of Crystal Growth"
DOI: 10.1016/j.jcrysgro.2018.06.019
Abstract: Abstract N-type 4H-SiC crystals were grown by the physical vapor transport (PVT) method with nitrogen and aluminum (N–Al) co-doping. By using aluminum carbide powder preannealed in nitrogen gas atmosphere as an aluminum doping source, we… read more here.
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Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.111016
Abstract: Abstract The electrical characteristics of Cr/Ni/Au and Ni/Cr/Au contacts to n-type 3C-SiC have been examined using a two-contact circular test structure. In Ni/Cr/Au contacts with Ni as contact layer and Cr as intermediate layer, both… read more here.
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Published in 2020 at "Microelectronics Reliability"
DOI: 10.1016/j.microrel.2020.113694
Abstract: Abstract The stability and reliability at high temperature of Ti3SiC2 based ohmic contacts on p-type 4H-SiC (0001) 4°-off substrates were studied. The contact was grown from Ti100-xAlx alloys annealed at high temperature (from 900 °C to… read more here.
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Published in 2020 at "Solid State Communications"
DOI: 10.1016/j.ssc.2019.113754
Abstract: Abstract 3C–SiC is a promising platform for semiconductor spintronics because it consists of light group-IV elements and has a zinc blende structure. To demonstrate spin transport in this attractive semiconductor, we conducted an experiment of… read more here.
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Published in 2020 at "Journal of Applied Physics"
DOI: 10.1063/5.0028458
Abstract: To date, research on defect-induced magnetism in SiC has been conducted to clarify the relationship between the ferromagnetic signal and the carrier concentration. It has been experimentally proven that there is an interaction between the… read more here.
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Published in 2019 at "Journal of Physics D: Applied Physics"
DOI: 10.1088/1361-6463/aaf8e9
Abstract: It is crucial to clarify the roles of phonon-assisted donor-acceptor pairs (DAPs) and free-to-acceptor (e-A) emissions in n-type 4H-SiC doped with nitrogen (N) and boron (B), where N and B induce the shallow donor and… read more here.
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Published in 2018 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/aade67
Abstract: Low temperature heteroepitaxy of cubic silicon carbide (3C-SiC) on silicon substrates is key to the low-cost and mass scale hetergeneous integration of 3C-SiC into the semiconductor market. Low temperature growth also opens up the opportunity… read more here.
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Published in 2018 at "Semiconductor Science and Technology"
DOI: 10.1088/1361-6641/aaec45
Abstract: A comparative investigation on the effects of sacrificial oxidation (SO) on the surface properties of n- and p-type 4H-SiC has been conducted by using x-ray photoelectron spectroscopy and deep level transient spectroscopy. For n-type 4H-SiC,… read more here.
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Published in 2024 at "Journal of Semiconductors"
DOI: 10.1088/1674-4926/23090024
Abstract: Radiation damage produced in 4H-SiC by electrons of different doses is presented by using multiple characterization techniques. Raman spectra results indicate that SiC crystal structures are essentially impervious to 10 MeV electron irradiation with doses… read more here.
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Published in 2024 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2024.3424460
Abstract: Junction Barrier Schottky (JBS) Diodes are fabricated for the first time on p-type Silicon Carbide (SiC) substrates with the avalanche breakdown voltage (BV) of 1200 V. The SiC p+ substrates are grown by the top… read more here.