Oxygen accumulation on metal surfaces investigated by XPS, AES and LEIS, an issue for sputter depth profiling under UHV conditions
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DOI: 10.1016/j.apsusc.2017.03.163
Abstract: Abstract Depth profiling using surface sensitive analysis methods in combination with sputter ion etching is a common procedure for thorough material investigations, where clean surfaces free of any contamination are essential. Hence, surface analytic studies… read more here.
Keywords: depth profiling; uhv conditions; metal surfaces; spectroscopy ... See more keywords