Modified Si Oxidation Behavior by Ultrathin Ni Catalyst Enabling Oxidant-Less Metal-Assisted Chemical Etching.
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DOI: 10.1002/smll.202409091
Abstract: Metal-assisted chemical etching (MACE), a wet-based anisotropic etching process for semiconductors, has emerged as an alternative to plasma-based etching. However, using noble metal catalysts in MACE limits the implementation of complementary metal-oxide-semiconductor (CMOS) processes. This… read more here.
Keywords: assisted chemical; catalyst; ultrathin catalyst; metal assisted ... See more keywords