Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography
Sign Up to like & getrecommendations! Published in 2020 at "IEEE Transactions on Semiconductor Manufacturing"
DOI: 10.1109/tsm.2019.2963483
Abstract: As extreme ultraviolet (EUV) lithography enters high volume manufacturing (HVM) to enable the sub-7nm scaling roadmap, characterizing and monitoring defects that print at wafer level are of critical importance to yield. This is especially true… read more here.
Keywords: stochastic defects; euv; ultraviolet euv; inspection ... See more keywords
Revisiting sunspot number as an extreme ultraviolet (EUV) proxy for ionospheric F2 critical frequency
Sign Up to like & getrecommendations! Published in 2025 at "Annales Geophysicae"
DOI: 10.5194/angeo-43-91-2025
Abstract: Abstract. This study reconsiders sunspot number (Sn) as a solar extreme ultraviolet (EUV) proxy for modeling the ionospheric F2 layer's critical frequency (foF2) over the period 1960–2023. We compare the performance of Sn with F10.7… read more here.
Keywords: critical frequency; euv proxy; extreme ultraviolet; ultraviolet euv ... See more keywords