Articles with "ultraviolet euv" as a keyword



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Inspection of Stochastic Defects With Broadband Plasma Optical Systems for Extreme Ultraviolet (EUV) Lithography

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Published in 2020 at "IEEE Transactions on Semiconductor Manufacturing"

DOI: 10.1109/tsm.2019.2963483

Abstract: As extreme ultraviolet (EUV) lithography enters high volume manufacturing (HVM) to enable the sub-7nm scaling roadmap, characterizing and monitoring defects that print at wafer level are of critical importance to yield. This is especially true… read more here.

Keywords: stochastic defects; euv; ultraviolet euv; inspection ... See more keywords