Thickness induced uniaxial anisotropy and unexpected four-fold symmetry in Co/SiO2/Si films
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DOI: 10.1063/1.5006504
Abstract: Co films with thickness ranging from 20 to 160 nm have been fabricated on SiO2/Si substrates by pulsed laser deposition method (PLD). It was found that that the Co crystal tends to have a structure… read more here.
Keywords: unexpected four; sio2; four fold; uniaxial anisotropy ... See more keywords