Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
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DOI: 10.1039/d0tc03216f
Abstract: Organic–inorganic hybrid compounds are arising as promising resist materials for extreme-ultraviolet (EUV) lithography, a new technique introduced in the semiconductor industry for the fabrication of integrated circuits of sub-10 nm feature size. In this work,… read more here.
Keywords: ligands hybrid; fluorinated ligands; spectroscopy; unravelling effect ... See more keywords