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Published in 2019 at "Materials Technology"
DOI: 10.1080/10667857.2019.1603185
Abstract: ABSTRACT In the present work SiNx thin films, grown by PECVD technique using dichlorosilane, were used in electroluminescent device (EL) structure. Series of experiments were carried out by varying the flow of H2 and SiH2Cl2,…
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Keywords:
using dichlorosilane;
thin films;
sinx thin;
emission ... See more keywords