Spectroscopic Properties of Si-nc in SiOx Films Using HFCVD
Sign Up to like & getrecommendations! Published in 2020 at "Nanomaterials"
DOI: 10.3390/nano10071415
Abstract: In the present work, non-stoichiometric silicon oxide films (SiOx) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential… read more here.
Keywords: spectroscopic properties; siox films; using hfcvd; films using ... See more keywords