Anticorrosive Behavior of SiC x N y O z Film Formed by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and Argon Gases
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DOI: 10.1149/2162-8777/ab6161
Abstract: A SiC x N y O z film was formed on an aluminum substrate without any heating assistance using monomethylsilane, nitrogen and argon gases at 10–30 Pa by the parallel plate plasma-enhanced chemical vapor deposition… read more here.
Keywords: nitrogen; using monomethylsilane; sic film; film ... See more keywords