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Published in 2019 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.03.027
Abstract: Abstract We have investigated the effect of nitrogen doping on the evolution of vacancy-oxygen (V-O) complexes in neutron irradiated Czochralski (CZ) silicon. During isothermal anneals in the temperature range of 290–330 °C, it is found that…
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Keywords:
vacancy oxygen;
oxygen complexes;
silicon;
complexes neutron ... See more keywords