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Published in 2020 at "Journal of Nanomaterials"
DOI: 10.1155/2020/3698543
Abstract: B-doped hydrogenated amorphous silicon (a-Si:H) films with various doping concentrations were prepared by a plasma-enhanced chemical vapor deposition (PECVD) technique. After thermal annealing, the as-deposited samples, B-doped silicon nanocrystals (Si NCs), were obtained in the…
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Keywords:
doping concentrations;
various doping;
films various;
transport properties ... See more keywords