Multidirectional UV lithography via inclined/rotated mirrors for liquid materials
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DOI: 10.35848/1882-0786/ab9656
Abstract: This paper presents development of an exposure equipment for inclined/rotating lithography with UV curable liquid materials. The proposed equipment is composed of inclined mirrors rotating around exposure spot and shading plate to prevent direct vertical… read more here.
Keywords: lithography via; liquid materials; via inclined; multidirectional lithography ... See more keywords