A novel wafer pre-alignment algorithm achieving a balance between precision and robustness based on five-layer neural network and iterative reweighted least squares
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DOI: 10.1088/1361-6501/ae1b29
Abstract: The trajectory fitting algorithm in the wafer pre-aligner plays a crucial role in the semiconductor manufacturing field, and the accuracy of wafer alignment determines the quality and yield of the process. However, existing methods still… read more here.
Keywords: wafer pre; least squares; loss; precision ... See more keywords