Articles with "wet etching" as a keyword



High‐Q Thin‐Film Lithium Niobate Microrings Fabricated with Wet Etching

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Published in 2022 at "Advanced Materials"

DOI: 10.1002/adma.202208113

Abstract: Thin‐film lithium niobate (TFLN) has been widely used in electro‐optic modulators, acoustic‐–optic modulators, electro‐optic frequency combs, and nonlinear wavelength converters owing to the excellent optical properties of lithium niobate. The performance of these devices is… read more here.

Keywords: wet etching; lithium niobate; film lithium; thin film ... See more keywords

Formation of 3D Free‐Form Artificial Compound Eye Mold by Maskless Discrete Wet‐Etching on Flat Fused Silica

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Published in 2025 at "Advanced Optical Materials"

DOI: 10.1002/adom.202502163

Abstract: Wet‐etching assisted by ultrafast laser for fabricating artificial comound eye (ACE) molds on hard materials has been under development for a decade. However, traditional methods have focused on simple‐shaped base molds, making it a significant… read more here.

Keywords: ace molds; wet etching; free form; form ... See more keywords

Construction of Metal-Organic Interface Layers via Highly Expandable Wet Etching for High Stability Zinc Anode.

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Published in 2025 at "Small"

DOI: 10.1002/smll.202502128

Abstract: Aqueous zinc-ion batteries (AZIBs) have gained significant traction in large-scale energy storage due to their notable safety and cost-effectiveness. Nevertheless, their commercialization has been significantly hindered by long-term issues such as dendrite growth, hydrogen evolution… read more here.

Keywords: metal organic; anode; wet etching; zinc ... See more keywords
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Efficient Terahertz Plasmonic Absorbers with V-Grooves Using Highly Doped Silicon Substrate and Simple Wet-Etching Techniques

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Published in 2017 at "Journal of Infrared, Millimeter, and Terahertz Waves"

DOI: 10.1007/s10762-017-0443-5

Abstract: We experimentally demonstrate that at terahertz frequencies perfect plasmonic absorbers made from a 3D V-groove array in a highly doped silicon wafer can be easily realized using simple wet-etching process. The surface plasmon modes can… read more here.

Keywords: highly doped; doped silicon; plasmonic absorbers; simple wet ... See more keywords
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Cavity etching evolution on the A-plane of sapphire crystal in molten KOH etchant

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Published in 2020 at "Journal of Crystal Growth"

DOI: 10.1016/j.jcrysgro.2020.125926

Abstract: Abstract Chemical wet etching technology is widely applied in semiconductor device fabrication such as the patterned sapphire substrates. However, the etching of pre-formed structure is still lack of investigations, which has potential applications in the… read more here.

Keywords: sapphire crystal; molten koh; sapphire; cavity ... See more keywords

Etching Behaviors of Sapphire's C- Plane Cavity

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Published in 2021 at "Surface Science"

DOI: 10.1016/j.susc.2021.121805

Abstract: Abstract Techniques to fabricate patterned sapphire substrates (PSSs) have attracted much attention in recent decades. Wet etching behaviors and crystalline sapphire processes are critical for PSSs applications to improve the performance of light-emitting diodes. This… read more here.

Keywords: plane; etching behaviors; sapphire; wet etching ... See more keywords

Toward Controllable Wet Etching of Monocrystalline Silicon: Roles of Mechanically Driven Defects.

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Published in 2022 at "ACS applied materials & interfaces"

DOI: 10.1021/acsami.2c04299

Abstract: Wet chemical etching is essential not only for processing silicon (Si) wafers but also for forming diverse structures, significantly promoting the development of the semiconductor industry. However, tight control of etched topography at the nanoscale… read more here.

Keywords: controllable wet; etching monocrystalline; roles mechanically; wet etching ... See more keywords

KOH Wet Etching Mechanisms of III-N Nanopillars: Impact of Temperature and Concentration.

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Published in 2025 at "ACS applied materials & interfaces"

DOI: 10.1021/acsami.5c01180

Abstract: Combining dry and wet etching processes is a common technique to pattern III-N semiconductors integrated in optoelectronic devices with a controlled final shape and high-quality crystallographic facets. However, the wet mechanisms driving the final pattern… read more here.

Keywords: wet etching; etching mechanisms; hard mask; koh wet ... See more keywords

Controllable Cyclic Wet Etching of Molybdenum at Room Temperature.

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Published in 2025 at "ACS applied materials & interfaces"

DOI: 10.1021/acsami.5c09076

Abstract: A cyclic wet etching process for molybdenum (Mo) film utilizing ammonium persulfate (APS) solution at room temperature has been developed, enabling precise etching of the Mo film. The etch per cycle (EPC) of the Mo… read more here.

Keywords: cyclic wet; wet etching; molybdenum; room temperature ... See more keywords

Wet-etching Fabrication of Flexible and Transparent Silicon Frameworks for Imperceptible Wearable Electronics

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Published in 2024 at "Journal of Materials Chemistry C"

DOI: 10.1039/d3tc04556k

Abstract: Electronic materials with mechanical flexibility and visual transparency are highly desirable for imperceptible wearable electronics that can alleviate wearing reluctance. However, as a well-functioned material in modern electronics, silicon is... read more here.

Keywords: flexible transparent; imperceptible wearable; fabrication flexible; wearable electronics ... See more keywords

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method.

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Published in 2018 at "Nanotechnology"

DOI: 10.1088/1361-6528/aaa523

Abstract: This paper presents an improved three-step wet etching method for the fabrication of single-crystal silicon nanopores and nanoslists. A diffusion model was built to analyze the influence of the color-based feedback mechanism on the final… read more here.

Keywords: nanopores nanoslits; fabrication; etching method; wet etching ... See more keywords