Adhesion of 2D MoS2 to Graphite and Metal Substrates Measured by a Blister Test.
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DOI: 10.1021/acs.nanolett.2c04886
Abstract: Using a blister test, we measured the work of separation between MoS2 membranes from metal, semiconductor, and graphite substrates. We found a work of separation ranging from 0.11 ± 0.05 J/m2 for chromium to 0.39… read more here.
Keywords: adhesion; adhesion mos2; blister test; work separation ... See more keywords