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Published in 2020 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2020.3025749
Abstract: We fabricated a quadruple-interface perpendicular magnetic tunnel junction (MTJ) (Quad-MTJ) down to 33 nm using physical vapor-deposition, reactive ion etching, and damage-control integration process technologies that we developed under a 300-mm process. We demonstrated the…
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Keywords:
quad mtj;
years retention;
mtj;
scalability ... See more keywords