Beyond decentralized wafer/reticle stage control design: A double-Youla approach for enhancing synchronized motion
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DOI: 10.1016/j.conengprac.2018.10.011
Abstract: Abstract Industrial wafer scanners often consists of multiple subsystems. Traditionally, these systems-of-systems are divided into manageable subproblems at the expense of the overall performance, that is determined by the synchronicity of the motions of the… read more here.
Keywords: control; performance; wafer; youla approach ... See more keywords